DLPR410 datasheet(34/53 Pages) TI2

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DLP650LNIR

DLPS136 – NOVEMBER 2018

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Micromirror Temperature Calculations (continued)

7.7.1 Sample Calculation 1: Uniform Illumination of Entire DMD Active Array (1280 × 800 pixels)

This calculation assumes that the entire DMD active array (1280 × 800) mirrors is uniformly illuminated with zero

overfill falling outside the Pond of Mirrors pixel border. The highest DMD temperatures typically occur when the

DMD mirrors are in the off-state (–12° landed) position. Therefore, the off-state fill factor calculates the worst

case mirror temperature. Calculate the mirror temperatures to assess the viability of the illumination conditions.

•

FFOFF-STATE-MIRROR = 75.3%

•

MR @ 1064 nm = 94%

•

αWINDOW@ 1064 nm = 0.7%

•

RMIRROR-TO-SILICON = 3.39E5 °C/Watt

•

RSILICON-TO-CERAMIC = 0.5 °C/Watt

•

Array Resolution = 1280 × 800

•

TCERAMIC = 30.0°C (measured)

•

QINCIDENT = 160 W (measured)

•

QELECTRICAL = 1.8 W

αDMD = [0.753 × (1-0.94)] + (1 - 0.753) + (2 × 0.007) = 0.31

QSILICON = 1.8 W + (0.31 × 160 W) = 51.4 W

QMIRROR = [(160W / (1280 × 800)] × 0.753 × (1 - 0.94) = 7.06E-6 W

Delta_TSILICON-TO-CERAMIC = 51.4 W × 0.5°C/W= 25.7°C

Delta_TMIRROR-TO-SILICON = 7.06E-6 W × 3.39E5 °C/W= 2.4°C

TMIRROR = 30.0°C + 25.7 + 2.4°C = 58.1°C

7.7.2 Sample Calculation 2: Partial DMD Active Array Illumination with Non-uniform Illumination Peak

This calculation assumes that only a subsection of the DMD active array 960 × 475 pixels in size is (non-

uniformly) illuminated. This calculation assumes the illuminated area is in the center of the DMD. Non-centered

area can affect the value of RSILICON-TO-CERAMIC. If the application requires offsetting the illumination on the DMD,

contact TI for more information on how to assess RSILICON-TO-CERAMIC. As in Sample Calculation 1, the off-state fill

factor can be used to assess the highest temperatures that can occur. Calculate the mirror temperatures which

occur at the highest illumination intensities to assess the viability of the illumination conditions.

•

FFOFF-STATE-MIRROR = 75.3%

•

MR @ 1064 nm = 94%

•

αWINDOW@ 1064 nm = 0.7%

•

RMIRROR-TO-SILICON = 3.39E5 °C/Watt

•

RSILICON-TO-CERAMIC = 0.9 °C/Watt (higher than previous example due to reduced illumination area)

•

Pixel Size = 10.8 µm = 0.00108 cm (square)

•

TCERAMIC = 30.0°C (measured)

•

QINCIDENT = 60 W (measured)

•

QELECTRICAL = 1.8 W

•

Peak Irradiance = 500 W/cm2 (measured)

αDMD = [0.753 × (1 - 0.94)] + (1 - 0.753) + (2 × 0.007) = 0.31

QSILICON = 1.8 W + (0.31 × 60 W) =20.4 W

QINCIDENT_MIRROR = Peak Irradiance (W/cm

2) × Pixel Area (cm2) = [500 W/cm2 × (0.00108 cm)2 ] = 5.832E-4 W

QMIRROR = 5.832E-4 W × 0.753 × (1 - 0.94) = 2.64E-5 W

Delta_TSILICON-TO-CERAMIC = 20.4 W × 0.9°C/W = 18.4°C

Delta_TMIRROR-TO-SILICON = 2.64E-5 W × 3.39E5°C/W= 8.9°C

TMIRROR = 30.0°C + 18.4°C + 8.9°C = 57.3°C

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