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AN3169 датащи(PDF) 3 Page - STMicroelectronics |
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AN3169 датащи(HTML) 3 Page - STMicroelectronics |
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3 / 12 page ![]() AN3169 Triac technologies and immunity Doc ID 17194 Rev 1 3/12 Figure 3. “Top” glass technology Both top and mesa glass technologies are very cost effective. The insulation capability of glass is very high. This helps to achieve high voltage devices with a limited periphery area. Mesa glass technology is the cheaper one as this technology uses less silicon area to withstand reverse voltage. For top technology, the reverse PN junction is terminated on the upper side of the die thanks to the deep P well. Such dies are bigger for the same active area than mesa dies. This is the reason why top technology is mainly used for low current Triacs. Unfortunately it is not possible to ensure a good operation of a die with glass passivation when the voltage exceeds its maximum allowed value (VDRM or VRRM parameters). If the voltage reaches the breakdown value, a current will flow through the die periphery, causing heat dissipation at the glass-silicon interface. This heat could cause mechanical stress and damage this interface. The device could then be damaged. To develop switches able to work up to their breakdown voltage, a planar technology has to be implemented. Such a technology uses photolithography to terminate the PN junction at the top of the die, and oxide passivation instead of glass (see Figure 4). There is no more glass-silicon interface issue. ACST devices use this kind of technology (see Reference 4). Figure 4. Planar technology N+ P N P N N N P Cathode Anode Metalization Gate Glass Metalization P N Cathode Gate Anode P N P Oxyde Passivation N N P N P N N P N N |
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