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AN1228 датащи(PDF) 4 Page - STMicroelectronics |
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AN1228 датащи(HTML) 4 Page - STMicroelectronics |
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4 / 6 page ![]() Defining ruggedness AN1228 4/6 the doping of the body and the metallurgical gate-source overlap. This capacitance is critical since it is the largest component of the input capacitance and constrains device switching speed which is comparable to limiting the maximum frequency of operation. Cds is the capacitance formed between the drain and ground plane where the referenced ground plane is formed by the LDMOS source, body, epitaxial layer and substrate. The charge formed by application of a voltage to the drain is dependent on the area of the LDD and the heavily doped drain, the concentration of the epitaxial layer and, to a lesser extent, the body doping. This capacitance is critical since it is the largest component of the output capacitance and influences device efficiency. Device datasheets identify these primary capacitances in the form of Crss, Ciss, and Coss. Capacitance Crss is simply the gate-drain capacitance, Cgd, whereas Ciss is the parallel combination of Cgs and Cgd. Capacitance Coss is the parallel combination of Cds and Cgd. The forward transconductance (gfs) identifies the differential drain current for a differential gate voltage. There are three major regions of the function gfs versus Vgs. As Vgs increases from low to mid-range values gfs expands until a linear gfs region is reached. Beyond this region, as high Vgs voltages are applied, gfs compresses. For Class AB operation the peak device current should remain below the gfs compression region for maximum linearity. The gfs specification is usually measured in the gfs linear region as shown on device datasheets. 2 Defining ruggedness The ruggedness or the load-mismatch tolerance of LDMOS technology can be defined in two ways. The first is that after being subjected to extreme load conditions there is not any degradation in device performance or output power. A more stringent criterion would be that there is not any degradation in the device parameters such as a shift in threshold voltage, an increase in leakage current or a subtle increase in Rds(on). Changes in these parameters can be an indication of long-term reliability problems. The overall ruggedness of a device when tested in extreme load conditions is related to the amount of localized thermal stress, the ability to sustain high levels of drain-source current in BVDSS maximum current capability and the intensity of avalanching occurring under or near the gate structure. |
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